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 Pulsatile Flow in U-tube Simulated Aortic Arch
Tác giả hoặc Nhóm tác giả: Le Minh Duc, Ching Min Hsu, Rong Fung Huang
Nơi đăng: Proceedings of ICETA-Fall November 7-9, 2017, Kitakyushu, Japan.; Số: ISSN: 2411-9318;Từ->đến trang: 3-14;Năm: 2017
Lĩnh vực: Khoa học công nghệ; Loại: Bài báo khoa học; Thể loại: Quốc tế
Flow and velocity characteristics of pulsatile flows in a model simulating an aortic arch was demonstrated through the use of particle image velocimetry (PIV). The model was an U-shaped transparent glass tube with three main branches (brachiocephalic artery, left common carotid artery, and left subclavian artery). The working fluid was a mixture of water and glycerol, which was used to simulate the viscosity of blood. Pulsatile flow simulating the output of a human heart beat was supplied by a pulsatile pump. The initial conditions set for this study were 72 strokes/minute (1.2 Hz) stroke rate, 70 ml/stroke volume rate, and 45%/55% of systole/diastole ratio. The temperature, Dean number, Womersley parameter, and time-averaged Reynolds number were 37°C, 730, 17.32, and 1,090, respectively. The temporal/spatial evolution processes of the flow pattern, velocity distribution, and wall-shear stress during systolic and diastolic phases are presented and discussed. No separation flow was found during the acceleration period of the systolic phase in the curvature. During the deceleration period of the systolic phase, the boundary-layer separation occurred on the inner wall and induced the rotating vortices at the entrances of the three branches and the descending thoracic aorta. The lager values of wall-shear stresses exhibited during the systolic phase around the leading section of the outer and inner walls of ascending aorta may be closely related to the formation of aortic aneurysm and dissection. The lower values of wall-shear stresses located around the outer wall of the aortic arch may be responsible for the plaque formation.Keywords: pulsatile pipe flow, PIV, flow in turn-around tube, velocity distribution, wall-shear stress.
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